Display apparatus and method of manufacturing the same

ABSTRACT

A display apparatus includes a first base substrate, a partitioning wall pattern disposed between a first pixel area and a second pixel area and on the first base substrate, a first color conversion pattern disposed in the first pixel area and including quantum dot particles and/or phosphor, a first fluorine layer disposed on the first color conversion layer, fluorine content of the first fluorine layer being higher than that of the first color conversion pattern, and a second color conversion pattern disposed in the second pixel area and including quantum dot particles and/or phosphor.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of U.S. patent application Ser. No.15/997,152, filed Jun. 4, 2018, which claims priority to and the benefitof Korean Patent Application No. 10-2017-0154314, filed Nov. 17, 2017,the entire content of both of which is incorporated herein by reference.

BACKGROUND 1. Field

Example embodiments of the inventive concept relate to a displayapparatus and a method of manufacturing the display apparatus. Moreparticularly, example embodiments of the inventive concept relate to adisplay apparatus having a color conversion layer using aphotoluminescence and a method of manufacturing the display apparatus.

2. Description of the Related Art

Recently, a display apparatus, which is light in weight and small insize, has been manufactured. A cathode ray tube (CRT) display apparatushas been used due to its performance and competitive price. However, thecomparative CRT display apparatus is large in size and has difficultieswith its portability. Therefore, a display apparatus (such as a plasmadisplay apparatus, a liquid crystal display apparatus and/or an organiclight emitting display apparatus) has been highly regarded due to itssmall size, light weight, and low-power-consumption.

The display apparatus may further include a color conversion layer usingphotoluminescence. The color conversion layer may include a colorconversion structure for converting color of light such as a quantumdot. A desired color can be imparted to an image by the color conversionlayer. Thus, color reproducibility of the image and the luminousefficiency can be improved, so that the display quality can be improved.However, the above-mentioned display apparatus having the colorconversion layer has a problem in that it is complex in structure,complex in the manufacturing process, and high in manufacturing cost.

Particularly, in order to reduce the costs, if an ink jet process isused for the display apparatus manufacturing process, a partitioningwall having a width equal to or larger than a certain size is requiredin order to prevent inkjet solution from leaking into neighboringpixels. As such, it has been difficult to improve the quality of thedisplay apparatus because an aperture ratio is limited by the partitionwall.

SUMMARY

One or more example aspects of the inventive concept provides a displayapparatus capable of improving aperture ratio and capable ofmanufacturing using an inkjet process.

One or more example aspects of the inventive concept also provide amethod of manufacturing the display apparatus.

According to an example embodiment of the inventive concept, a displayapparatus includes a first base substrate, a partitioning wall patterndisposed between a first pixel area and a second pixel area and on thefirst base substrate, a first color conversion pattern disposed in thefirst pixel area and including quantum dot particles and/or phosphor, afirst fluorine layer disposed on the first color conversion layer,fluorine content of the first fluorine layer being higher than that ofthe first color conversion pattern, and a second color conversionpattern disposed in the second pixel area and including quantum dotparticles and/or phosphor.

In an example embodiment, the display apparatus may further include ahydrophobic layer formed on the partitioning wall pattern.

In an example embodiment, an upper surface of the first fluorine layermay be higher than an upper surface of the hydrophobic layer from thefirst base substrate. The upper surface of the first fluorine layer maybe a surface of the first fluorine layer which is facing away (e.g.,furthest) from the first base substrate. The upper surface of thehydrophobic layer may be a surface of the hydrophobic layer which isfacing away (e.g., furthest) from the first base substrate.

In an example embodiment, the display apparatus may further include alight blocking pattern overlapping with the partitioning wall patternand including a light blocking material.

In an example embodiment, the display apparatus may further include asecond fluorine layer disposed on the second color conversion layer,fluorine content of the second fluorine layer being higher than that ofthe second color conversion pattern. Refractive index of the firstfluorine layer may be lower than that of the first color conversionpattern. Refractive index of the second fluorine layer may be lower thanthat of the second color conversion pattern.

In an example embodiment, the display apparatus may further include atransparent layer disposed in the first pixel area, the second pixelarea and a third pixel area which is spaced apart from the first andsecond pixel areas to cover the first fluorine layer and the secondfluorine layer, a second base substrate facing the first base substrate,a thin film transistor disposed on the second base substrate, a liquidcrystal layer disposed between the first base substrate and the secondbase substrate, and a backlight unit emitting a blue light. The firstcolor conversion pattern may include red quantum dot particles and/orred phosphor, and the second color conversion pattern may include greenquantum dot particles and/or green phosphor.

In an example embodiment, the display apparatus may further include awire grid polarizer disposed on the transparent layer, and an insulationlayer disposed on the wire grid polarizer.

In an example embodiment, the display apparatus may further include afirst color filter disposed between the first color conversion patternand the first base substrate, and a second color filter disposed betweenthe second color conversion pattern and the first base substrate.

In an example embodiment, the first color conversion pattern may furtherinclude epoxy and/or epoxy-acrylate. The first fluorine layer mayinclude fluorine and/or fluoropolymer.

In an example embodiment, the first color conversion pattern and thefirst fluorine layer may be formed in one layer whose boundary isunclear. This one layer may have a first portion which is close to thefirst base substrate and a second portion which is far from the firstbase substrate. A content of fluorine and/or fluoropolymer in the secondportion may be larger than that in the first portion.

According to an example embodiment of the inventive concept, a method ofmanufacturing a display apparatus includes forming a partitioning wallpattern on a first base substrate between a first pixel area and asecond pixel area, providing a first color conversion inkjet solutionincluding a solvent and a fluorine surfactant, forming a first colorconversion pattern and a first fluorine layer on the first colorconversion pattern by curing the first color conversion inkjet solution,providing a second color conversion inkjet solution in the second pixelarea on the first substrate on which the first fluorine layer is formed,and forming a second color conversion pattern by curing the second colorconversion inkjet solution.

In an example embodiment, the first color conversion pattern may furtherinclude red quantum dot particles and/or red phosphor, and epoxy and/orepoxy-acrylate. The second color conversion pattern may further includegreen quantum dot particles and/or green phosphor.

In an example embodiment, the method may further include forming ahydrophobic layer on the partitioning wall pattern before providing thefirst color conversion inkjet solution.

In an example embodiment, the first fluorine layer may be formed to havea convex shape on its upper surface with a height higher than an uppersurface of the hydrophobic layer from the first base substrate.

In an example embodiment, the method may further include forming a lightblocking pattern on the first base substrate, or the partitioning wallpattern may include a light blocking material.

In an example embodiment, the method may further include forming a firstcolor filter by an inkjet method in the first pixel area and forming asecond color filter in the second pixel area before providing the firstcolor conversion inkjet solution.

In an example embodiment, in providing the second color conversioninkjet solution, the second color conversion inkjet solution may includea solvent and a fluorine surfactant. In forming the second colorconversion pattern, the second color conversion pattern and a secondfluorine layer on the second color conversion pattern may be formed bycuring the second color conversion inkjet solution. Refractive index ofthe first fluorine layer may be lower than that of the first colorconversion pattern. Refractive index of the second fluorine layer may belower than that of the second color conversion pattern.

In an example embodiment, forming the partitioning wall pattern mayinclude forming a partitioning wall layer on the first base substrate,forming a preliminary hydrophobic layer on the partitioning wall layer,and forming the partitioning wall pattern and a hydrophobic layer on thepartitioning wall pattern by patterning the preliminary hydrophobiclayer and the partitioning wall layer.

In an example embodiment, the method may further include forming a bluelight blocking pattern on the first base substrate in the first pixelarea and the second pixel area before providing the first colorconversion inkjet solution.

In an example embodiment, the first color conversion pattern and thefirst fluorine layer may be formed in one layer whose boundary isunclear. The one layer may have a first portion which is close to thefirst base substrate and a second portion which is far from the firstbase substrate. A content of fluorine and/or fluoropolymer in the secondportion may be larger than that in the first portion.

According to the present inventive concept, a display apparatus includea first base substrate, a partitioning wall pattern, a first colorconversion pattern, a first fluorine layer on the first color conversionpattern, and a second fluorine layer on the second color conversionpattern. Here, because the first fluorine layer and the second fluorinelayer are low refractive index layers compared to that of the firstcolor conversion pattern and the second color conversion pattern and maywork as the optical recycling filter, there is no need to form anadditional optical recycling filter.

In addition, a method of manufacturing a display apparatus includesproviding a first color conversion inkjet solution, forming a firstcolor conversion pattern and a first fluorine layer on the first colorconversion pattern by curing the first color conversion inkjet solution,providing a second color conversion inkjet solution, and forming asecond color conversion pattern by curing the second color conversioninkjet solution. Here, by the hydrophobic layer on the partitioning wallpattern, the second color conversion inkjet solution does not deviatefrom its corresponding pixel area (overflow is prevented and/orblocked), and is provided only in the corresponding pixel area.Accordingly, the second color conversion inkjet solution may besufficiently and/or precisely provided.

In addition, the first fluorine layer is also hydrophobic, so that thefirst fluorine layer as well as the hydrophobic layer on thepartitioning wall pattern may also act as a barrier to prevent and/orblock overflow of the second color conversion inkjet solution.

In addition, since the first color conversion inkjet solution issufficiently provided, the first fluorine layer may be formed to have aconvex shape on its upper surface and be formed with a height higherthan an upper surface of the hydrophobic layer. Accordingly, overflow ofthe second color conversion inkjet solution may be prevented and/orblocked more efficiently. Thus, even if a width of the upper surface ofthe partitioning wall pattern is narrower than the general case, theoverflow of the inkjet solution can be easily controlled, and anaperture ratio of the display apparatus can be improved while using theinkjet process.

It is to be understood that both the foregoing general description andthe following detailed description are exemplary and explanatory and areintended to provide further explanation of the invention as claimed.

BRIEF DESCRIPTION OF THE DRAWINGS

The above and other features of the inventive concept will become moreapparent by describing in detail example embodiments thereof withreference to the accompanying drawings, in which:

FIG. 1 is a block diagram illustrating a display apparatus according toan example embodiment of the inventive concept;

FIG. 2 is a cross-sectional view taken along a line I-I′ of FIG. 1;

FIG. 3 is a cross-sectional view illustrating a display apparatusaccording to an example embodiment of the inventive concept;

FIG. 4 is a cross-sectional view illustrating a display apparatusaccording to an example embodiment of the inventive concept;

FIG. 5 is a cross-sectional view illustrating a display apparatusaccording to an example embodiment of the inventive concept;

FIG. 6 is a cross-sectional view illustrating a display apparatusaccording to an example embodiment of the inventive concept;

FIG. 7 is a cross-sectional view illustrating a display apparatusaccording to an example embodiment of the inventive concept;

FIGS. 8A to 8J are cross-sectional views illustrating a method ofmanufacturing the display apparatus of FIG. 2;

FIGS. 9A and 9B are cross-sectional views illustrating another method ofmanufacturing the display apparatus of FIG. 2;

FIGS. 10A to 10H are cross-sectional views illustrating a method ofmanufacturing the display apparatus of FIG. 3;

FIGS. 11A to 11E are cross-sectional views illustrating a method ofmanufacturing the display apparatus of FIG. 4;

FIGS. 12A to 12E are cross-sectional views illustrating a method ofmanufacturing the display apparatus of FIG. 5;

FIGS. 13A to 13C are cross-sectional views illustrating a method ofmanufacturing the display apparatus of FIG. 6; and

FIGS. 14A to 14E are cross-sectional views illustrating a method ofmanufacturing the display apparatus of FIG. 7.

DETAILED DESCRIPTION

Hereinafter, the inventive concept will be explained in more detail withreference to the accompanying drawings.

FIG. 1 is a block diagram illustrating a display apparatus according toan example embodiment of the inventive concept.

Referring to FIG. 1, the display apparatus may include a display panel10 and a display panel driver. The display panel driver may include atiming controller 20, a gate driver 30, a gamma reference voltagegenerator 40 and a data driver 50. The display apparatus may furtherinclude a backlight unit (BLU of FIG. 2).

The display panel 10 includes a plurality of gate lines GL, a pluralityof data lines DL, and a plurality of pixels electrically connected tothe gate lines GL and the data lines DL, respectively. The gate lines GLmay extend in a first direction D1, and the data lines DL may extend ina second direction D2 which crosses the first direction D1.

Each of the pixels may include a switching element, a liquid crystalcapacitor electrically connected to the switching element, and a storagecapacitor. The pixels may be arranged in a matrix form.

The display panel 10 may include a second substrate on which the gatelines, the data lines, the pixels, the switching elements are formed,and a first substrate facing the first substrate and including a secondelectrode which is a common electrode, and a liquid crystal layerbetween the first substrate and the second substrate.

A pixel structure of the display panel 10 will be described in moredetail with reference to FIGS. 2 and 3.

The timing controller 20 may receive input image data IMG and an inputcontrol signal CONT from an external apparatus. The input image data mayinclude red image data, green image data and blue image data. The inputcontrol signal CONT may include a master clock signal and a data enablesignal. The input control signal CONT may further include a verticalsynchronizing signal and a horizontal synchronizing signal.

The timing controller 20 may generate a first control signal CONT1, asecond control signal CONT2, a third control signal CONT3 and a datasignal DATA based on the input image data IMG and the input controlsignal CONT.

The timing controller 20 may generate the first control signal CONT1 forcontrolling an operation of the gate driver 30 based on the inputcontrol signal CONT, and outputs the first control signal CONT1 to thegate driver 30. The first control signal CONT1 may further include avertical start signal and a gate clock signal.

The timing controller 20 may generate the second control signal CONT2for controlling an operation of the data driver 50 based on the inputcontrol signal CONT, and outputs the second control signal CONT2 to thedata driver 50. The second control signal CONT2 may include a horizontalstart signal and a load signal.

The timing controller 20 may generate the data signal DATA based on theinput image data IMG. The timing controller 20 may output the datasignal DATA to the data driver 50.

The timing controller 20 may generate the third control signal CONT3 forcontrolling an operation of the gamma reference voltage generator 40based on the input control signal CONT, and output the third controlsignal CONT3 to the gamma reference voltage generator 40.

The gate driver 30 may generate gate signals driving the gate lines GLin response to the first control signal CONT1 received from the timingcontroller 20. The gate driver 30 may sequentially output the gatesignals to the gate lines GL.

The gamma reference voltage generator 40 may generate a gamma referencevoltage VGREF in response to the third control signal CONT3 receivedfrom the timing controller 20. The gamma reference voltage generator 40may provide the gamma reference voltage VGREF to the data driver 50. Thegamma reference voltage VGREF may have a value corresponding to a levelof the data signal DATA.

In an exemplary embodiment, the gamma reference voltage generator 40 maybe disposed in the timing controller 20, or in the data driver 50.

The data driver 50 may receive the second control signal CONT2 and thedata signal DATA from the timing controller 20, and receive the gammareference voltages VGREF from the gamma reference voltage generator 40.The data driver 50 may convert the data signal DATA into data voltageshaving an analog type using the gamma reference voltages VGREF. The datadriver 50 may output the data voltages to the data lines DL.

The display apparatus may include a green pixel area GPX emitting greenlight, a red pixel area RPX emitting red light, a blue pixel area PBXemitting blue light and a light blocking area to divide these areas.

FIG. 2 is a cross-sectional view taken along a line I-I′ of FIG. 1.

Referring to FIG. 2, the display apparatus may include a firstsubstrate, a second substrate facing the first substrate, a liquidcrystal layer 300 disposed between the first substrate and the secondsubstrate and a backlight unit BLU. The first substrate may include afirst base substrate 100, a light blocking pattern BM, a first colorfilter RCF, a second color filter GCF, a partitioning wall pattern 110,a hydrophobic layer 120, a first color conversion pattern RQD, a firstfluorine layer RFL, a second color conversion layer GQD, a secondfluorine layer GFL, a transparent layer 130, a wire grid polarizer 140,an insulation layer 150, and a second electrode EL2. The secondsubstrate may include a second base substrate 200, a thin filmtransistor TFT, a TFT insulation layer 210, and a first electrode EL1.

The first base substrate 100 may include a transparent insulationsubstrate. For example, the first base substrate 100 may include a glasssubstrate, a quartz substrate, a transparent resin substrate, etc.Examples of the transparent resin substrate for the first base substrate100 may include polyimide-based resin, acryl-based resin,polyacrylate-based resin, polycarbonate-based resin, polyether-basedresin, sulfonic acid containing resin, polyethyleneterephthalate-basedresin, etc.

The light blocking pattern BM may be disposed on the first basesubstrate 100. The light blocking pattern BM may include a blightblocking material. The light blocking pattern may be disposed in thelight blocking area between a green pixel area GPX, a red pixel area RPXand a blue pixel area BPX to divide each of the pixel areas.

The first color filter RCF may be disposed in the red pixel area RPX onthe first base substrate 100 on which the light blocking pattern BM isdisposed. The first color filter RCF may be a red color filter. Thefirst color filter RCF may pass only a wavelength band corresponding toa red light of light passing through the first color filter RCF.

The second color filter GCF may be disposed in the green pixel area GPXon the first base substrate 100 on which the light blocking pattern BMis disposed. The second color filter GCF may be a green color filter.The second color filter GCF may pass only a wavelength bandcorresponding to a green light of light passing through the second colorfilter GCF.

The partitioning wall pattern 110 may be disposed on the light blockingpattern BM. The partitioning wall pattern 110 may be formed using aphotoresist material. The partitioning wall pattern 110 is a structurefor partitioning the red pixel area RPX in which the first colorconversion pattern RQD is formed and the green pixel area GPX in whichthe second color conversion pattern GPX is formed to form the firstcolor conversion pattern RQD and the second color conversion pattern GQDat a set or predetermined location when the first color conversionpattern RQD and the second color conversion pattern GQD are formed bythe ink jet method.

The hydrophobic layer 120 may be formed on the partitioning wall pattern110. The hydrophobic layer 120 is hydrophobic in water, and thehydrophobic layer 120 may prevent and/or block the first colorconversion pattern RQD and the second color conversion pattern GQD fromoverflowing out of the partitioning wall pattern 110 when the firstcolor conversion pattern RQD and the second color conversion pattern GQDare formed in the inkjet method. The hydrophobic layer 120 may be formedby partially hydrophobizing a surface of the partitioning wall pattern110 by plasma treatment or the like. Accordingly, the hydrophobic layer120 may be formed on upper and side surfaces of the partitioning wallpattern 110 except for a lower surface that contacts the light blockingpattern BM.

The first color conversion pattern RQD may be formed on the first colorfilter RCF in the red pixel area RPX. The first color conversion patternRQD may be a red color conversion pattern. The first color conversionpattern RQD may convert a blue light provided from the backlight unitBLU into red light. For example, the first color conversion pattern RQDmay include red quantum dot particles and/or red phosphor. In addition,the first color conversion pattern RQD may further include epoxy and/orepoxy-acrylate. For example, the first color conversion pattern RQD mayfurther include MMA (methyl-metha-acrylate) and/or PMMA(Poly-memethyl-metha-acrylate).

The first fluorine layer RFL may be disposed on the first colorconversion pattern RQD. The first fluorine layer RFL may includefluorine and/or fluoropolymer. The first fluorine layer RFL may beformed on the first color conversion pattern RQD due to aself-stratification of fluorine surfactant component of inkjet solutionin a curing process to form the first color conversion pattern RQD. Inaddition, a height of a top surface of the first fluorine layer RFL fromthe first base substrate 100 may be greater than or equal to a height ofa top surface of the hydrophobic layer 120 on the partitioning wallpattern 110 from the first base substrate 100.

The second color conversion pattern GQD may be disposed on the secondcolor filter GCF in the green pixel area GPX. The second colorconversion pattern GQD may be a green color conversion pattern. Thesecond color conversion pattern GQD may convert a blue light providedfrom the backlight unit BLU into green light. For example, the secondcolor conversion pattern GQD may include green quantum dot particlesand/or green phosphor. In addition, the second color conversion patternGQD may further include epoxy and/or epoxy-acrylate. For example, thesecond color conversion pattern GQD may further include MMA(methyl-metha-acrylate) and/or PMMA (Poly-memethyl-metha-acrylate).

The second fluorine layer GFL may be disposed on the second colorconversion pattern GQD. The second fluorine layer GFL may includefluorine and/or fluoropolymer. The second fluorine layer GFL may beformed on the second color conversion pattern GQD due to aself-stratification of fluorine surfactant component of inkjet solutionin a curing process to form the second color conversion pattern GQD.

The red or green quantum dot may be a material that has a nano-scaledstructure and may include several hundred to several thousand atoms.Since the quantum dot is very small in size, a quantum confinementeffect may occur. The quantum confinement effect may indicate that anenergy band gap of an object is increased when the nano size objectbecomes smaller. When the light having energy higher than that of theband gap is incident to the quantum dot, the quantum dot may absorb thelight and may emit a second light having a specific wavelength and anenergy level in the ground state. The wavelength of the emitted secondlight may have a value corresponding to the band gap. When a size and acomposition of the quantum dot are adjusted, the emission property ofthe quantum dot may be controlled by the quantum confinement.

The composition of the quantum dots is not limited to a specificcomposition, and any suitable composition may be used. For example, thequantum dot may be a quantum dot of Group II-VI elements, Group III-Velements, Group IV elements, or Group IV-VI elements. The Group IIelements may be selected from the group consisting of at least one ofzinc, cadmium, and mercury. The group III elements may be selected fromthe group consisting of at least one of aluminum, gallium, and indium.The Group IV elements may be selected from the group consisting of atleast one of silicon, germanium, tin, and lead. The Group V elements maybe selected from the group consisting of at least one of nitrogen,phosphorus, and arsenic. The Group VI elements may be selected from thegroup consisting of at least one of sulfur, selenium, and tellurium.

The transparent layer 130 may be disposed on the first base substrate100 on which the first color conversion pattern RQD and the second colorconversion pattern GQD are disposed. The transparent layer 130 may bedisposed in the blue pixel area BPX between the partitioning wallpattern 110, and may be formed corresponding to the entire first basesubstrate 100 to cover all of the partitioning wall pattern 110, thefirst fluorine layer RFL and the second fluorine layer GFL. Thetransparent layer 130 may include scattering particles that changetraveling direction of light passing therethrough without changingcolor. The scattering particles may be particles of TiO2 or the like.Size of the scattering particle may be similar to size of the redquantum dot particle or the green quantum dot particle.

The wire grid polarizer 140 may be disposed on the transparent layer130. The wire grid polarizer 140 may include a plurality of fine linesextending in one direction and formed at uniform intervals to form awire grid. The fine lines may have pitch of about 50 nm (nanometers) to150 nm. The pitch may be defined as sum of width of one of the finelines and a distance between two of the fine lines disposed adjacent toeach other.

The insulation layer 150 may be disposed on the wire grid polarizer 140for capping the wire grid polarizer 140. The insulation layer 150 mayinclude inorganic and/or organic insulation material.

The second electrode EL2 may be disposed on (below) the insulation layer150. A common voltage may be applied to the second electrode LE2. Thesecond electrode EL2 may include a transparent conductive material. Forexample, the second electrode EL2 may include indium tin oxide (ITO),indium zinc oxide (IZO), etc.

The second base substrate 200 may be disposed to face the first basesubstrate 100. The second base substrate 200 may include a glasssubstrate, a quartz substrate, a transparent resin substrate, etc.Examples of the transparent resin substrate for the second basesubstrate 200 may include polyimide-based resin, acryl-based resin,polyacrylate-based resin, polycarbonate-based resin, polyether-basedresin, sulfonic acid containing resin, polyethyleneterephthalate-basedresin, etc.

The thin film transistor TFT may be disposed on the second basesubstrate 200. The thin film transistor TFT may be electricallyconnected to a data line (refers to DL of FIG. 1) and a gate line(refers to GL of FIG. 1).

The TFT insulation layer 210 may be disposed on the second basesubstrate 200 on which the thin film transistor TFT is formed. Each ofthe thin film transistor TFT and the TFT insulation layer 210 is shownas one configuration in the figures, but may be composed of a pluralityof layers. For example, a gate pattern, a gate insulating layer, anactive pattern, a data pattern, a data insulating layer, and the likemay be sequentially formed on the second base substrate 200 to form thethin film transistor TFT and the TFT insulating layer 210.

The first electrode EL1 may be disposed on the TFT insulation layer 210.The first electrode EL1 may be electrically connected to the thin filmtransistor TFT through a contact hole formed through the TFT insulationlayer 210. The first electrode EL1 may include a transparent conductivematerial. For example, the first electrode EU may include indium tinoxide (ITO), indium zinc oxide (IZO), etc.

The liquid crystal layer 300 may be disposed between the first electrodeEL1 and the second electrode EL2. The liquid crystal layer 300 mayinclude liquid crystal molecules having optical anisotropy. The liquidcrystal molecules are driven by electric field, so that an image isdisplayed by passing or blocking light through the liquid crystal layer300.

The backlight unit BLU may be disposed under the second base substrate200 to provide light toward the liquid crystal layer 300. In particular,the backlight unit BLU may generate blue light and provide this bluelight toward the liquid crystal layer 300.

In one embodiment, the display apparatus may further include an upperalignment layer formed between the liquid crystal layer 300 and thesecond electrode EL2, a lower alignment layer formed between the liquidcrystal layer 300 and the first electrode EL1, and a lower polarizerdisposed on (below) the second base substrate 200, etc.

Although the display apparatus includes the liquid crystal layer in thepresent embodiment, the display apparatus may be a device for generatinglight for displaying an image in addition to a liquid crystal displaydevice and may be a variety of devices, such as an organic lightemitting display, an electrophoretic display, an electrowetting display,and the like, but it is not limited thereto.

Each of the first fluorine layer RFL and the second fluorine layer GFLis a layer having smaller refractive index than that of the first colorconversion pattern RQD and the second color conversion pattern GQD.Since the first fluorine layer RFL and the second fluorine layer GFLfurther contain fluorine (F) compared with the first color conversionpattern RQD and the second color conversion pattern GQD, respectively,so that the first fluorine layer RFL and the second fluorine layer GFLhave lower refractive index than that of the first color conversionpattern RQD and the second color conversion pattern GQD, respectively.Accordingly, reflected light which is generated from the backlight unitBLU and is reflected while passing through the first or second colorconversion pattern RQD or GQD, the first or second color filter RCF orGCF and the first base substrate 100, may be reflected to be reusedand/or recycled.

Thus, the first fluorine layer RFL and the second fluorine layer GFL arelow refractive index layers compared to the first color conversionpattern RQD and the second color conversion pattern GQD and may act asan optical recycling filter. Since the first fluorine layer RFL and thesecond fluorine layer GFL which is naturally formed by theself-stratification during the curing process to form the first colorconversion pattern RQD and the second color conversion pattern GQD workas the optical recycling filter, there is no need to form an additionaloptical recycling filter.

FIG. 3 is a cross-sectional view illustrating a display apparatusaccording to an example embodiment of the inventive concept.

Referring to FIG. 3, the display apparatus may be substantially the sameas the display apparatus of FIG. 2 except that a light blocking patternBM acts as a partitioning wall pattern instead of the partitioning wallpattern. Therefore, repeated description will be omitted.

The display apparatus may include a first substrate, a second substratefacing the first substrate, a liquid crystal layer 300 disposed betweena backlight unit BLU and the first substrate and the second substrate.The first substrate may include a first base substrate 100, a lightblocking pattern BM, a first color filter RCF, a second color filterGCF, a hydrophobic layer 1120, a first color conversion pattern RQD, afirst fluorine layer RFL, a second color conversion layer GQD, a secondfluorine layer GFL, a transparent layer 130, a wire grid polarizer 140,an insulation layer 150 and a second electrode EL2. The second substratemay include a second base substrate 200, a thin film transistor TFT, aTFT insulation layer 210, and a first electrode EL1.

The light blocking pattern BM may be disposed on the first basesubstrate 100. The light blocking pattern BM may include a lightblocking material. The light blocking pattern may be disposed in thelight blocking area between a green pixel area GPX, a red pixel area RPXand a blue pixel area BPX to divide each of the pixel areas.

The hydrophobic layer 1120 may be formed on the light blocking patternBM. The hydrophobic layer 1120 is hydrophobic in water, and thehydrophobic layer 120 may prevent and/or block the first colorconversion pattern RQD and the second color conversion pattern GQD fromoverflowing out when the first color conversion pattern RQD and thesecond color conversion pattern GQD are formed in the inkjet method. Thehydrophobic layer 120 may be formed by partially hydrophobizing asurface of the light blocking pattern BM by plasma treatment or thelike.

The first color filter RCF may be disposed in the red pixel area RPX onthe first base substrate 100 on which the light blocking pattern BM isdisposed. The second color filter GCF may be disposed in the green pixelarea GPX on the first base substrate 100 on which the light blockingpattern BM is disposed.

The first color conversion pattern RQD may be disposed on the firstcolor filter RCF in the red pixel area RPX. The first fluorine layer RFLmay be disposed on the first color conversion pattern RQD.

The second color conversion pattern GQD may be disposed on the secondcolor filter GCF in the green pixel area GPX. The second fluorine layerGFL may be disposed on the second color conversion pattern GQD.

In the present embodiment, the light blocking pattern BM may be formedat a height sufficiently high to work not only to block light but alsoto work as a partitioning wall pattern of the display apparatus of FIG.2. Therefore, unlike the display apparatus of FIG. 2, it is notnecessary to form an additional partitioning wall pattern.

FIG. 4 is a cross-sectional view illustrating a display apparatusaccording to an example embodiment of the inventive concept.

Referring FIG. 4, the display apparatus may be substantially the same asthe display apparatus of FIG. 2, except for a third color conversionpattern BQD disposed in a blue pixel region BPX and a third fluorinelayer BFL and the backlight unit BLU. Therefore, repeated descriptionwill be omitted.

The display apparatus may include a first substrate, a second substratefacing the first substrate, a liquid crystal layer 300 disposed betweenthe first substrate and the second substrate and a backlight unit BLU.The first substrate may include a first base substrate 100, a lightblocking pattern BM, a first color filter RCF, a second color filterGCF, a third color filter BCF, a partitioning wall pattern 110, ahydrophobic layer 120, a first color conversion pattern RQD, a firstfluorine layer RFL, a second color conversion layer GQD, a secondfluorine layer GFL, a third color conversion layer BQD, a third fluorinelayer BFL, a transparent layer 130, a wire grid polarizer 140, aninsulation layer 150 and a second electrode EL2. The second substratemay include a second base substrate 200, a thin film transistor TFT, aTFT insulation layer 210 and a first electrode EL1.

The third color filter BCF may be disposed in a blue pixel area BPX onthe first base substrate 100 on which the light blocking pattern BM isdisposed. The third color filter BCF may be a blue color filter. Thethird color filter BCF may pass only a wavelength band corresponding toa blue light of light passing through the third color filter BCF.

The third color conversion pattern BQD may be formed on the third colorfilter BCF in the blue pixel area BPX. The third color conversionpattern BQD may be a blue color conversion pattern. The third colorconversion pattern BQD may convert a light provided from the backlightunit BLU into blue light. For example, the third color conversionpattern BQD may include blue quantum dot particles and/or blue phosphor.In addition, the third color conversion pattern BQD may further includeepoxy and/or epoxy-acrylate. For example, the third color conversionpattern BQD may further include MMA (methyl-metha-acrylate) and/or PMMA(Poly-memethyl-metha-acrylate).

The third fluorine layer BFL may be disposed on the third colorconversion pattern BQD. The third fluorine layer BFL may includefluorine and/or fluoropolymer. The third fluorine layer BFL may beformed on the third color conversion pattern BQD due to aself-stratification of fluorine surfactant component of inkjet solutionin a curing process to form the third color conversion pattern BQD.

The transparent layer 130 may be formed corresponding to the entirefirst base substrate 100 to cover all of the partitioning wall pattern110, the first fluorine layer RFL, the second fluorine layer GFL and thethird fluorine layer BFL.

The backlight unit BLU may provide white light unlike the displayapparatus of FIG. 2.

FIG. 5 is a cross-sectional view illustrating a display apparatusaccording to an example embodiment of the inventive concept.

Referring to FIG. 5, the display apparatus may be substantially the sameas the display apparatus of FIG. 2, except that the display apparatusfurther includes a blue light blocking pattern Y and a transparentpattern W disposed in a blue pixel area BPX. Therefore, repeateddescription will be omitted.

The display apparatus may include a first substrate, a second substratefacing the first substrate, a liquid crystal layer 300 disposed betweenthe first substrate and the second substrate and a backlight unit BLU.The first substrate may include a first base substrate 100, a lightblocking pattern BM, a blue light blocking pattern Y, a partitioningwall pattern 110, a hydrophobic layer 120, a first color conversionpattern RQD, a first fluorine layer RFL, a second color conversion layerGQD, a second fluorine layer GFL, a transparent pattern B, a transparentlayer 130, a wire grid polarizer 140, an insulation layer 150 and asecond electrode EL2. The second substrate may include a second basesubstrate 200, a thin film transistor TFT, a TFT insulation layer 210and a first electrode EL1.

The blue light blocking pattern Y may be disposed in a red pixel areaRPX and a green pixel area GPX on the first base substrate on which thelight blocking pattern BM is disposed. The blue light blocking pattern Ymay pass only light having a wavelength band excluding a blue wavelengthband and may block light corresponding to the blue wavelength band. Theblue light blocking pattern Y may be a yellow color filter.

The partitioning wall pattern 110 may be disposed on the blue lightblocking pattern Y and the light blocking pattern BM to overlap thelight blocking pattern BM.

The transparent pattern B may be disposed on the first base substrate100 in the blue pixel area BPX. The transparent pattern may includescattering particles that change traveling direction of light passingtherethrough without changing color. The scattering particles may beparticles of TiO2 or the like. Size of the scattering particle may besimilar to size of the red quantum dot particle or the green quantum dotparticle. In addition, the transparent pattern B may further include ablue pigment for converting light transmitted through the transparentpattern B into blue light.

FIG. 6 is a cross-sectional view illustrating a display apparatusaccording to an example embodiment of the inventive concept.

Referring to FIG. 6, the display apparatus may be substantially the sameas the display apparatus of FIG. 2, except that a hydrophobic layer 2120is formed only on an upper surface of the partitioning wall pattern 110.Therefore, repeated description will be omitted.

The display apparatus may include a first substrate, a second substratefacing the first substrate, a liquid crystal layer 300 disposed betweenthe first substrate and the second substrate and a backlight unit BLU.The first substrate may include a first base substrate 100, a lightblocking pattern BM, a first color filter RCF, a second color filterGCF, a partitioning wall pattern 110, a hydrophobic layer 2120, a firstcolor conversion pattern RQD, a first fluorine layer RFL, a second colorconversion layer GQD, a second fluorine layer GFL, a transparent layer130, a wire grid polarizer 140, an insulation layer 150 and a secondelectrode EL2. The second substrate may include a second base substrate200, a thin film transistor TFT, a TFT insulation layer 210 and a firstelectrode EL1.

The hydrophobic layer 2120 may be formed on the partitioning wallpattern 110. The hydrophobic layer 2120 may be formed only on the uppersurface of the partitioning wall pattern 110 which is opposite to alower surface that makes contact with the light blocking pattern BM.

FIG. 7 is a cross-sectional view illustrating a display apparatusaccording to an example embodiment of the inventive concept.

Referring to FIG. 7, the display apparatus may be substantially the sameas the display apparatus of FIG. 2, except that a fluorine layer doesnot form a separate layer and a color conversion layer includes a firstportion and a second portion which includes fluorine. Therefore,repeated descriptions will be omitted.

The display apparatus may include a first substrate, a second substratefacing the first substrate, a liquid crystal layer 300 disposed betweenthe first substrate and the second substrate and a backlight unit BLU.The first substrate may include a first base substrate 100, a lightblocking pattern BM, a first color filter RCF, a second color filterGCF, a partitioning wall pattern 110, a hydrophobic layer 120, a firstcolor conversion pattern RQD, a second color conversion layer GQD, atransparent layer 130, a wire grid polarizer 140, an insulation layer150 and a second electrode EL2. The second substrate may include asecond base substrate 200, a thin film transistor TFT, a TFT insulationlayer 210 and a first electrode EL1.

The first color conversion pattern RQD may include a first portion RQD1and a second portion RQD2 disposed on the first portion RQD1. The firstportion RQD1 of the first color conversion pattern RQD is closer to thefirst base substrate 100 than the second portion RQD2. The secondportion RQD2 of the first color conversion pattern RQD is further fromthe first base substrate 100 than the first portion RQD1 is from thefirst base substrate 100.

The first color conversion pattern RQD which includes the first portionRQD1 and the second portion RQD2 may be a red color conversion pattern.The first color conversion pattern RQD may include red quantum dotparticles and/or red phosphor. In addition, the first color conversionpattern RQD may further include epoxy and/or epoxy-acrylate. Forexample, the first color conversion pattern RQD may further include MMA(methyl-metha-acrylate) and/or PMMA (Poly-memethyl-metha-acrylate). Inaddition, the first color conversion pattern RQD may further includefluorine and/or fluoropolymer.

Here, a content of fluorine and/or fluoropolymer of the second portionRQD2 is greater than a content of fluorine and/or fluoropolymer of thefirst portion RQD1. Thus, in the display apparatus of FIG. 2, thefluorine surfactant component in the inkjet solution is relativelycompletely separated, and the fluorine layer is formed so as to beseparated from the color conversion pattern. In this embodiment,separation is relatively incomplete, so that a boundary between thefirst portion RQD1 and the second portion RQD2 may not be clear.

The second color conversion pattern GQD may include a first portion GQD1and a second portion GQD2 disposed on the first portion GQD1. The firstportion GQD1 of the second color conversion pattern GQD is closer to thefirst base substrate 100 than the second portion GQD2.

The second color conversion pattern GQD which includes the first portionGQD1 and the second portion GQD2 may be a green color conversionpattern. The second color conversion pattern GQD may include greenquantum dot particles and/or green phosphor. In addition, the secondcolor conversion pattern GQD may further include epoxy and/orepoxy-acrylate. For example, the second color conversion pattern GQD mayfurther include MMA (methyl-metha-acrylate) and/or PMMA(Poly-memethyl-metha-acrylate). In addition, the second color conversionpattern GQD may further include fluorine and/or fluoropolymer.

Here, a content of fluorine and/or fluoropolymer of the second portionGQD2 is greater than a content of fluorine and/or fluoropolymer of thefirst portion GQD1. Thus, in the display apparatus of FIG. 2, thefluorine surfactant component in the inkjet solution is relativelycompletely separated, and the fluorine layer is formed so as to beseparated from the color conversion pattern. In this embodiment,separation is relatively incomplete, so that a boundary between thefirst portion GQD1 and the second portion GQD2 may not be clear.

FIGS. 8A to 8J are cross-sectional views illustrating a method ofmanufacturing the display apparatus of FIG. 2.

Referring to FIG. 8A, a light blocking pattern BM may be formed on afirst base substrate 100. The light blocking pattern BM may be formed bycoating a photoresist material including a light blocking material onthe first base substrate 100, exposing and developing the same. Thelight blocking pattern BM may define a red pixel area RPX, a green pixelarea GPX, and a blue pixel area BPX.

Referring to FIG. 8B, a first color filter RCF may be formed in the redpixel area RPX on the first base substrate 100 on which the lightblocking pattern BM is formed. The first color filter RCF may be formedusing a photoresist method, an ink jet method, or the like.

A second color filter (GCF) may be formed on the green pixel area GPX onthe first base substrate 100 on which the light blocking pattern BM isformed. The second color filter GCF may be formed using a photoresistmethod, an ink jet method, or the like.

Referring to FIG. 8C, a partitioning wall pattern 110 may be formed onthe light blocking pattern BM. The partitioning wall pattern 110 may beformed by coating a photoresist material on the base substrate 100 onwhich the light blocking pattern BM is formed, exposing and developingthe same. It is preferable that the partitioning wall pattern 110overlaps with the light blocking pattern BM and has substantially thesame pattern shape as that of the light blocking pattern BM, so that thesame mask as that used in the exposure process to form the lightblocking pattern BM can be used.

Referring to FIG. 8D, a hydrophobic layer 120 may be formed on upper andside surfaces of the partitioning wall pattern 110 by hydrophobictreatment of the upper and side surfaces of the partitioning wallpattern 110. For example, the hydrophobic layer 120 may be formed bypartially hydrophobizing the upper and side surfaces of the lightblocking pattern BM by plasma treatment or the like.

Referring to FIG. 8E, a first color conversion inkjet solution RQDa maybe provided on the first color filter RCF in the red pixel area RPXusing an inkjet method. The first color conversion inkjet solution RQDamay include fluorine surfactant and red quantum dot particles and/or redphosphor. In addition, the first color conversion inkjet solution RQDamay further include epoxy and/or epoxy-acrylate. For example, the firstcolor conversion inkjet solution RQDa may further include MMA(methyl-metha-acrylate) and/or PMMA (Poly-memethyl-metha-acrylate). Thefirst color conversion inkjet solution RQDa may further include asolvent for an inkjet process. The solvent may be hydrophilic.

Here, by the hydrophobic layer 120 on the partitioning wall pattern 110,the hydrophilic first color conversion inkjet solution RQDa does notdeviate from the red pixel area RPX (overflow is prevented and/orblocked), and is provided only in the red pixel area RPX. Accordingly,the first color conversion inkjet solution RQDa may be sufficientlyprovided.

Referring to FIG. 8F, the first color conversion inkjet solution RQDamay be cured by heating the first color conversion inkjet solution RQDa.Accordingly, the first color conversion pattern RQD may be formed. Here,a first fluorine layer RFL may be formed on the first color conversionpattern RQD due to a self-stratification of fluorine surfactantcomponent of the first color conversion inkjet solution RQDa. The firstfluorine layer RFL may include fluorine and/or fluoropolymer.

The self-stratification occurs in a phase-separated liquid mixturecontaining a low surface energy layered resin and a substantially higherfree surface energy base resin, and at the time of heat treatment at atemperature to maintain fluidity, evaporation of the layer causesacceleration of the layer separation. That is, due to the low expressiontension of the fluorine component contained in the fluorinatedsurfactant, phase separation progresses may be performed by a propertyof the fluorine component coming into contact with an upper air layer,the first color conversion pattern forms a layer of fluorine componentson top of the first color conversion pattern RQD. Accordingly, a firstfluorine layer RFL on the first color conversion pattern RQD and thefirst color conversion pattern RQD may be formed.

Referring to FIG. 8G, a second color conversion inkjet solution GQDa maybe provided on the second color filter GCF in the green pixel area GPXusing an inkjet method. The second color conversion inkjet solution GQDamay include fluorine surfactant and green quantum dot particles and/orgreen phosphor. In addition the second color conversion inkjet solutionGQDa may further include epoxy and/or epoxy-acrylate. For example, thesecond color conversion inkjet solution GQDa may further include MMA(methyl-metha-acrylate) and/or PMMA (Poly-memethyl-metha-acrylate). Thesecond color conversion inkjet solution GQDa may further include asolvent for an inkjet process. The solvent may be hydrophilic.

Here, by the hydrophobic layer 120 on the partitioning wall pattern 110,the hydrophilic second color conversion inkjet solution GQDa does notdeviate from the green pixel area GPX (overflow is prevented and/orblocked), and is provided only in the green pixel area GPX. Accordingly,the second color conversion inkjet solution GQDa may be sufficientlyprovided.

Here, the first fluorine layer RFL on the first color conversion patternon the RQD is also hydrophobic, so that the first fluorine layer RFL aswell as the hydrophobic layer 120 on the partitioning wall pattern 110may also act as a barrier to prevent and/or block overflow of the secondcolor conversion inkjet solution GQDa. Thus, the second color conversioninkjet solution GQDa may be prevented and/or blocked from overflowing tothe red pixel region RPX by the partitioning wall pattern 110, thehydrophobic layer 120, and the first fluorine layer RFL.

In addition, since the first color conversion inkjet solution (see RQDain FIG. 8E) is sufficiently provided, the first fluorine layer RFL maybe formed to have a convex shape on its upper surface and be formed witha height H higher than an upper surface of the hydrophobic layer 120.Accordingly, overflow of the second color conversion inkjet solutionGQDa may be prevented and/or blocked more efficiently.

Thus, even if a width W of the upper surface of the partitioning wallpattern 110 is narrower than the general case, the overflow of theinkjet solution can be easily controlled, and an aperture ratio of thedisplay apparatus can be improved while using the inkjet process.

Referring to FIG. 8H, the second color conversion inkjet solution GQDamay be cured by heating the second color conversion inkjet solutionGQDa. Accordingly, the second color conversion pattern GQD may beformed. Here, a second fluorine layer GFL may be formed on the secondcolor conversion pattern GQD due to a self-stratification of fluorinesurfactant component of the second color conversion inkjet solutionGQDa. The second fluorine layer GFL may include fluorine and/orfluoropolymer.

Referring to FIG. 8I, a transparent layer 130 may be formed on the firstbase substrate 100 of which the first color conversion pattern RQD andthe second color conversion pattern GQD are formed. The transparentlayer 130 may be formed corresponding to the entire first base substrate100 to cover all of the partitioning wall pattern 110, the firstfluorine layer RFL, and the second fluorine layer GFL. The transparentlayer 130 may include scattering particles that change the travelingdirection of light passing therethrough without changing color. An uppersurface of the transparent layer 130 may be flat for the followingprocesses.

Thereafter, a wire grid polarizer 140 may be formed on the transparentlayer 130. The wire grid polarizer 140 may be formed by forming a metallayer on the transparent layer 130 and then patterning the metal layerby imprint lithography or the like.

Thereafter, an insulation layer 150 may be formed on the wire gridpolarizer 140. The insulation layer 150 may include an inorganic ororganic insulating material. Depending on the material of the insulationlayer 150, the insulation layer 150 may be obtained by a spin coatingprocess, a chemical vapor deposition process, a plasma enhanced chemicalvapor deposition process, a high density plasma-chemical vapordeposition process, or the like.

And then, a second electrode EL1 may be formed on the insulation layer150.

Referring to FIG. 8J, a thin film transistor TFT may be formed on asecond base substrate 200. A TFT insulating layer 210 may be formed onthe second base substrate 200 on which the thin film transistor TFT isformed. A first electrode EL1 may be formed on the TFT insulating layer210. The thin film transistor TFT, the TFT insulating layer 210, and thefirst electrode EL1 may be formed by a related art method of forming aTFT substrate of a general display apparatus.

After a liquid crystal layer 300 is formed between the first electrodeEL1 and the second electrode EL2, a backlight unit BLU may be preparedto manufacture the display apparatus. The liquid crystal layer 300 andthe backlight unit BLU may be manufactured by a related art method.

FIGS. 9A and 9B are cross-sectional views illustrating another method ofmanufacturing the display apparatus of FIG. 2. The method may besubstantially the same as the method of FIGS. 8A to 8J, except for theorder of forming a partitioning wall pattern 110, a hydrophobic layer120, a first color filter RCF, and a second color filter BCF. Therefore,repeated description will be omitted.

Referring to FIG. 9A, a light blocking pattern BM may be formed on afirst base substrate 100. A partitioning wall pattern 110 may be formedon the light blocking pattern BM. A hydrophobic layer 120 may be formedon a surface of the partitioning wall pattern 110.

Referring to FIG. 9B, a first color filter RCF and a second color filterGCF may be formed on the base substrate 100 on which the hydrophobiclayer 120 is formed. Since the partitioning wall pattern 110 and thehydrophobic layer 120 have already been formed, the first color filterRCF and the second color filter GCF may be formed by an inkjet processusing the partitioning wall pattern 110 and the hydrophobic layer 120.At this time, the first color filter RCF and the second color filter RCFmay be easily formed using a hydrophilic inkjet solution similar to thecase of the color conversion pattern. (refers to FIG. 8E, etc.)

Thereafter, the display apparatus may be manufactured using the samemethod as described in FIGS. 8E to 8J.

FIGS. 10A to 10H are cross-sectional views illustrating a method ofmanufacturing the display apparatus of FIG. 3. The method may besubstantially the same as the method of FIGS. 8A to 8J, except that apartitioning wall pattern is not formed separately and a light blockingpattern BM works as a partitioning wall pattern. Therefore, repeateddescription will be omitted.

Referring to FIG. 10A, a light blocking pattern BM may be formed on afirst base substrate 100. The light blocking pattern BM may be formed bycoating a photoresist material including a light blocking material onthe first base substrate 100, exposing and developing the same. Thelight blocking pattern BM may define a red pixel area RPX, a green pixelarea GPX and a blue pixel area BPX. And then, a hydrophobic layer 1120can be formed on upper and side surfaces of the light blocking patternBM by hydrophobic treatment of the surface of the light blocking patternBM. For example, the hydrophobic layer 1120 may be formed by partiallyhydrophobizing the surfaces of the light blocking pattern BM through aplasma treatment or the like.

Referring to FIG. 10B, a first color filter RCF and a second colorfilter GCF may be formed on the first base substrate 100 on which thelight blocking pattern BM and the hydrophobic layer 120 are formed. Thefirst color filter RCF and the second color filter GCF may be formedusing a photoresist method, an ink jet method, or the like. Preferably,the first color filter RCF and the second color filter GCF may be formedby the inkjet method using the light blocking pattern BM and thehydrophobic layer 120 that were already formed.

Referring to FIG. 10C, a first color conversion inkjet solution RQDa maybe provided on the first color filter RCF in the red pixel RPX by aninkjet method.

Referring to FIG. 10D, the first color conversion inkjet solution RQDamay be cured by heating the first color conversion inkjet solution RQDa.Accordingly, the first color conversion pattern RQD may be formed. Here,a first fluorine layer RFL may be formed on the first color conversionpattern RQD due to a self-stratification of fluorine surfactantcomponent of the first color conversion inkjet solution RQDa.

Referring to FIG. 10E, a second color conversion inkjet solution GQDamay be provided on the second color filter GCF in the green pixel areaGPX using an inkjet method.

Referring to FIG. 10F, the second color conversion inkjet solution GQDamay be cured by heating the second color conversion inkjet solutionGQDa. Accordingly, the second color conversion pattern GQD may beformed. Here, a second fluorine layer GFL may be formed on the secondcolor conversion pattern GQD due to a self-stratification of fluorinesurfactant component of the second color conversion inkjet solutionGQDa.

Referring to FIG. 10G, a transparent layer 130 may be formed on thefirst base substrate 100 of which the first color conversion pattern RQDand the second color conversion pattern GQD are formed. Thereafter, awire grid polarizer 140 may be formed on the transparent layer 130.Thereafter, an insulation layer 150 may be formed on the wire gridpolarizer 140. And then, a second electrode EL1 may be formed on theinsulation layer 150.

Referring to FIG. 10H, a thin film transistor TFT may be formed on asecond base substrate 200. A TFT insulating layer 210 may be formed onthe second base substrate 200 on which the thin film transistor TFT isformed. A first electrode EL1 may be formed on the TFT insulating layer210. The thin film transistor TFT, the TFT insulating layer 210 and thefirst electrode EL1 may be formed by a related art method of forming aTFT substrate of a general display apparatus.

After a liquid crystal layer 300 is formed between the first electrodeEL1 and the second electrode EL2, a backlight unit BLU may be preparedto manufacture the display apparatus. The liquid crystal layer 300 andthe backlight unit BLU may be manufactured by a related art method.

FIGS. 11A to 11E are cross-sectional views illustrating a method ofmanufacturing the display apparatus of FIG. 4. The method may besubstantially the same as the method of FIGS. 8A to 8J or 9A and 9B,except for further forming a third color filter BCF, a third colorconversion pattern BQD and a third fluorine layer BFL. Therefore,repeated description will be omitted.

Referring to FIG. 11A, a first color filter RCF, a second color filterGCF, a third color filter BCF, a partitioning wall pattern 110 and ahydrophobic layer 120 may be formed on a first base substrate 100.

The third color filter BCF may be formed in a manner similar to thefirst or second color filter RCF or GCF and may be formed before orafter forming the partitioning wall pattern 110 and the hydrophobiclayer 120.

Referring to FIG. 11B, a first color conversion inkjet solution may beprovided on the first color filter RCF in the red pixel RPX by an inkjetmethod. And then, the first color conversion inkjet solution may becured by heating. A first fluorine layer RFL on the first colorconversion pattern RQD and the first color conversion pattern RQD may beformed.

Referring to FIG. 11C, a second color conversion inkjet solution may beprovided on the second color filter GCF in the green pixel RPX by aninkjet method. And then, the second color conversion inkjet solution maybe cured by heating. A second fluorine layer GFL on the second colorconversion pattern GQD and the second color conversion pattern GQD maybe formed.

Referring to FIG. 11D, a third color conversion inkjet solution may beprovided on the third color filter BCF in the blue pixel BPX by aninkjet method. And then, the third color conversion inkjet solution maybe cured by heating. A third fluorine layer BFL on the third colorconversion pattern BQD and the third color conversion pattern BQD may beformed.

Referring to FIG. 11E, a transparent layer 130, a wire grid polarizer140, an insulation layer 150, and a second electrode EL2 may be formedon the first base substrate 100. A thin film transistor TFT, a TFTinsulation layer 210, and a first electrode LE1 may be formed on asecond base substrate 200. After forming a liquid crystal layer 300between the first electrode EU and the second electrode EL2, a backlightunit BLU may be arranged to thereby manufacture the display apparatus.

FIGS. 12A to 12E are cross-sectional views illustrating a method ofmanufacturing the display apparatus of FIG. 5. The method may besubstantially the same as the method of FIGS. 8A to 8J or 9A and 9B,except for forming a blue light blocking pattern Y instead of first andsecond color filters and forming a transparent pattern W disposed in ablue pixel region BPX. Therefore, repeated description will be omitted.

Referring to FIG. 12A, a light blocking pattern BM may be formed on thefirst base substrate 100. A blue light blocking pattern Y may be formedin the red pixel area RPX and the green pixel region GPX on the firstbase substrate 100 on which the light blocking pattern BM is formed. Theblue light blocking pattern Y may pass only light having a wavelengthband excluding a blue wavelength band and may block light correspondingto the blue wavelength band.

Referring to FIG. 12B, a partitioning wall pattern 110 may be formed onthe blue light blocking pattern Y and the light blocking pattern BM. Andthen, a hydrophobic layer 120 may be formed through a surface treatmentof the partitioning wall pattern 110.

Referring to FIG. 12C, a first color conversion inkjet solution may beprovided on the blue light blocking pattern Y in the red pixel area RPXusing an inkjet method. And then, the first color conversion inkjetsolution may be cured by heating. Accordingly, a first fluorine layerRFL on the first color conversion pattern RQD and the first colorconversion pattern RQD may be formed.

Referring to FIG. 12D, a second color conversion inkjet solution may beprovide on the blue light blocking pattern Y in the green pixel area GPXby an inkjet method. And then, the second color conversion inkjetsolution may be cured by heating. A second fluorine layer GFL on thesecond color conversion pattern GQD and the second color conversionpattern GQD may be formed.

Referring to FIG. 12E, a transparent layer 130, a wire grid polarizer140, an insulation layer 150 and a second electrode EL2 may be formed onthe first base substrate 100. A thin film transistor TFT, a TFTinsulation layer 210, and a first electrode LE1 may be formed on asecond base substrate 200. After forming a liquid crystal layer 300between the first electrode EU and the second electrode EL2, a backlightunit BLU may be prepared to manufacture the display apparatus.

FIGS. 13A to 13C are cross-sectional views illustrating a method ofmanufacturing the display apparatus of FIG. 6. The method may besubstantially the same as the method of FIGS. 8A to 8J, except that alight blocking pattern BM, a partitioning wall pattern 110, and ahydrophobic layer 2120 are patterned in one continuous process.Therefore, repeated description will be omitted.

Referring to FIG. 13A, a light blocking layer BMa including a lightblocking material may be formed on a first base substrate 100. Apartitioning wall layer 110 a may be formed on the light blocking layerBMa. A preliminary hydrophobic layer 2120 a may be formed on thepartitioning wall layer 110 a. The preliminary hydrophobic layer 2120 amay be formed through a surface treatment of the partitioning wall layer110 a.

Referring to FIG. 13B, the preliminary hydrophobic layer 2120 a, thepartitioning wall layer 110 a, and the light blocking layer BMa may bepatterned to form a light blocking pattern BM on the first basesubstrate 100, a partitioning wall pattern 110 on the light blockingpattern BM, and a hydrophobic layer 2120 on the partitioning wallpattern 110.

Referring to FIG. 13C, a first color filter RCF, a second color filterGCF, a first color conversion pattern RQD, a first fluorine layer RFL, asecond color conversion layer GQD, a second fluorine layer GFL, atransparent layer 130, a wire grid polarizer 140, an insulation layer150, and a second electrode EL2 may be formed on the first basesubstrate 100. A thin film transistor TFT, a TFT insulation layer 210,and a first electrode EL1 may be formed on a second base substrate 200.After forming a liquid crystal layer 300 between the first electrode EUand the second electrode EL2, a backlight unit BLU may be prepared tomanufacture the display apparatus.

FIGS. 14A to 14E are cross-sectional views illustrating a method ofmanufacturing the display apparatus of FIG. 7. The method may besubstantially the same as the method of FIGS. 8A to 8J, except that afluorine layer does not form a separate layer and a color conversionlayer includes a first portion and a second portion which includesfluorine. Therefore, repeated description will be omitted.

Referring to FIG. 14A, a light blocking pattern BM, a first color filterRCF, a second color filter GCF, a partitioning wall pattern 110, and ahydrophobic layer 120 may be formed on the first base substrate 100.

And then, first color conversion inkjet solution RQDa may be provided onthe first color filter RCF in the red pixel area RPX using an inkjetmethod.

Referring to FIG. 14B, the first color conversion inkjet solution RQDamay be cured by heating. Accordingly, a first color conversion patternRQD including a first portion RQD1 and a second portion RQD2 on thefirst portion RQD1 may be formed. A boundary of the first portion RQD1and the second portion RQD2 may be unclear. Here, a content of fluorineand/or fluoropolymer in the second portion RQD2 is larger than that inthe first portion RQD2.

Referring to FIG. 14C, a second color conversion inkjet solution GQDamay be provided on the second color filter GCF in the green pixel areaGPX using an inkjet method.

Referring to FIG. 14D, the second color conversion inkjet solution GQDamay be cured by heating. Accordingly, a second color conversion patternGQD including a first portion GQD1 and a second portion GQD2 on thefirst portion GQD1 may be formed. A boundary of the first portion GQD1and the second portion GQD2 may be unclear. Here, a content of fluorineand/or fluoropolymer in the second portion GQD2 is larger than that inthe first portion GQD2.

Referring to FIG. 14E, a transparent layer 130, a wire grid polarizer140, an insulation layer 150, and a second electrode EL2 may be formedon the first base substrate 100. A thin film transistor TFT, a TFTinsulation layer 210 and a first electrode EL1 may be formed on a secondbase substrate 200. After forming a liquid crystal layer 300 between thefirst electrode EU and the second electrode EL2, a backlight unit BLUmay be prepared to manufacture the display apparatus.

According to the present inventive concept, a display apparatus includesa first base substrate, a partitioning wall pattern, a first colorconversion pattern, a first fluorine layer on the first color conversionpattern, and a second fluorine layer on the second color conversionpattern. The first fluorine layer and the second fluorine layer are lowrefractive index layers compared to the first color conversion patternand the second color conversion pattern and may work as the opticalrecycling filter, and there is no need to form an additional opticalrecycling filter.

In addition, a method of manufacturing a display apparatus includesproviding a first color conversion inkjet solution, forming a firstcolor conversion pattern and a first fluorine layer on the first colorconversion pattern by curing the first color conversion inkjet solution,providing a second color conversion inkjet solution, and forming asecond color conversion pattern by curing the second color conversioninkjet solution. Here, by the hydrophobic layer on the partitioning wallpattern, the second color conversion inkjet solution does not deviatefrom corresponding pixel area (overflow is prevented and/or blocked),and is provided only in the corresponding pixel area. Accordingly, thesecond color conversion inkjet solution may be sufficiently provided.

In addition, the first fluorine layer is also hydrophobic, so that thefirst fluorine layer as well as the hydrophobic layer on thepartitioning wall pattern may also act as a barrier to prevent and/orblock overflow of the second color conversion inkjet solution.

In addition, since the first color conversion inkjet solution issufficiently provided, the first fluorine layer may be formed to have aconvex shape on its upper surface and be formed with a height higherthan an upper surface of the hydrophobic layer. Accordingly, overflow ofthe second color conversion inkjet solution may be prevented and/orblocked more efficiently. Thus, even if a width of the upper surface ofthe partitioning wall pattern is narrower than the general case, theoverflow of the inkjet solution can be easily controlled, and anaperture ratio of the display apparatus can be improved while using theinkjet process.

The use of “may” when describing embodiments of the present inventionrefers to “one or more embodiments of the present invention.” It will beunderstood that when an element or layer is referred to as being “on”,“connected to”, “coupled to”, or “adjacent to” another element or layer,it can be directly on, connected to, coupled to, or adjacent to theother element or layer, or one or more intervening elements or layersmay be present. In contrast, when an element or layer is referred to asbeing “directly on,” “directly connected to”, “directly coupled to”, or“immediately adjacent to” another element or layer, there are nointervening elements or layers present. As used herein, the terms “use,”“using,” and “used” may be considered synonymous with the terms“utilize,” “utilizing,” and “utilized,” respectively.

The foregoing is illustrative of the inventive concept and is not to beconstrued as limiting thereof. Although a few example embodiments of theinventive concept have been described, those skilled in the art willreadily appreciate that many modifications are possible in the exampleembodiments without materially departing from the novel teachings andadvantages of the inventive concept. Accordingly, all such modificationsare intended to be included within the scope of the inventive concept asdefined in the claims. In the claims, means-plus-function clauses areintended to cover the structures described herein as performing therecited function and not only structural equivalents but also equivalentstructures. Therefore, it is to be understood that the foregoing isillustrative of the inventive concept and is not to be construed aslimited to the specific example embodiments disclosed, and thatmodifications to the disclosed example embodiments, as well as otherexample embodiments, are intended to be included within the scope of theappended claims. The inventive concept is defined by the followingclaims, with equivalents of the claims to be included therein.

What is claimed is:
 1. A method of manufacturing a display apparatus,the method comprising: forming a partitioning wall pattern on a firstbase substrate between a first pixel area and a second pixel area;providing a first color conversion inkjet solution comprising quantumdot particles and/or phosphor, a solvent, and a fluorine surfactant;forming a first color conversion pattern and a first fluorine layerdirectly on and covering the first color conversion pattern bystratifying the fluorine surfactant in the first color conversion inkjetsolution and curing the first color conversion inkjet solution;providing a second color conversion inkjet solution comprising quantumdot particles and/or phosphor in the second pixel area on the first basesubstrate on which the first fluorine layer is formed; and forming asecond color conversion pattern by curing the second color conversioninkjet solution.
 2. The method of claim 1, wherein the first colorconversion pattern comprises red quantum dot particles and/or redphosphor, and epoxy and/or epoxy-acrylate, and the second colorconversion pattern comprises green quantum dot particles and/or greenphosphor.
 3. The method of claim 2, further comprising: before providingthe first color conversion inkjet solution, forming a hydrophobic layeron the partitioning wall pattern.
 4. The method of claim 3, wherein aheight of an upper surface of the first fluorine layer is higher than anupper surface of the hydrophobic layer from the first base substrate. 5.The method of claim 3, wherein the method further comprises forming alight blocking pattern on the first base substrate, or wherein thepartitioning wall pattern comprises a light blocking material.
 6. Themethod of claim 3, further comprising: before providing the first colorconversion inkjet solution, forming a first color filter by an inkjetmethod in the first pixel area and forming a second color filter in thesecond pixel area.
 7. The method of claim 1, wherein in providing thesecond color conversion inkjet solution, the second color conversioninkjet solution comprises a solvent and a fluorine surfactant, andwherein in forming the second color conversion pattern, the second colorconversion pattern and a second fluorine layer on the second colorconversion pattern are formed by curing the second color conversioninkjet solution, and wherein a refractive index of the first fluorinelayer is lower than that of the first color conversion pattern, and arefractive index of the second fluorine layer is lower than that of thesecond color conversion pattern.
 8. The method of claim 1, wherein theforming of the partitioning wall pattern comprises: forming apartitioning wall layer on the first base substrate; forming apreliminary hydrophobic layer on the partitioning wall layer; andforming the partitioning wall pattern and a hydrophobic layer on thepartitioning wall pattern by patterning the preliminary hydrophobiclayer and the partitioning wall layer.
 9. The method of claim 1, furthercomprising: before providing the first color conversion inkjet solution,forming a blue light blocking pattern on the first base substrate in thefirst pixel area and the second pixel area.
 10. The method of claim 1,wherein the first color conversion pattern and the first fluorine layerare formed in one layer whose boundary is unclear, the one layer havinga first portion that is closer to the first base substrate and a secondportion that is further from the first base substrate, and a content offluorine and/or fluoropolymer in the second portion is greater than thatin the first portion.